Jacqueline Ahrens
Jacqueline Ahrens
Height: 5-7
Year: So.
Hometown: Rancho Palos Verdes, Calif.
High School: Palos Verdes Peninsula
Position: Pole Vault
Major: Materials Science Engineering

Collegiate Personal Bests
Indoor:
PV - 12', 11.5" (3.95m) - MIT Rookie Record

Outdoor:
PV - 12', 5.5" (3.80m) - MIT Rookie Record

2017-18: USTFCCCA All-American (Indoor - Pole Vault, Outdoor - Pole Vault)... NCAA Qualifier (Indoor - Pole Vault, Outdoor - Pole Vault)... New England D3 Champion (Indoor - Pole Vault, Outdoor - Pole Vault)... All-New England (Indoor - Pole Vault, Outdoor - Pole Vault)... Tied the D3 Championship record for the pole vault at the indoor championship... NEICAA All-Region (Outdoor - Pole Vault)... USTFCCCA All-Academic Team... Finished sixth in the pole vault at the NCAA Outdoor Championship and the NEICAAA Outdoor Championship... Cleared 12 feet, 5.5 inches while finishing second at the NEWMAC Championship... Won the New England D3 Indoor Championship with a season-best height of 12 feet, 11.5 inches... Was sixth at the NCAA Indoor Championship... Won three other indoor meets... Was fourth at the NEICAAA Indoor Championship at 12 feet, 3.5 inches.

Off the Track at MIT: Majoring in materials science engineering... Interned at SpaceX... Conducted Metallurgy Research in Professor Tasan's group.

High School: Three-year letter winner in track and field at Palos Verdes Peninsula High School... Was ranked fourth in California in 2016 and posted a personal-best of 13 feet in the pole vault in high school... 2016 and 2017 CIF Division 1 Champion... Seventh place at the 2017 state meet and eighth in 2016... Bay League Champion... Team MVP... Freshman, sophomore and varsity school record holder... Member of the National Honor Society, the National Science Honor Society, Mu Alpha Theta, the National Chinese Honor Society and the California Scholarship Federation... Involved in FRC Robotics, the Technology Student Association and the Young Entrepreneur's Academy... Won the Bausch and Lomb Honorary Science Award.